Interferometers and scales are used in ultraprecision
machining equipment and semiconductor
manufacturing equipment.
While interferometers have the major advantages
that they can be used in line and that
they have good linearity, they have the disadvantage
that when used in air, the laser wavelength
used as the reference for measurement
can change with air disturbances and changes
in air pressure.
In contrast, scales are difficult to use in line,
and their linearity is inferior to that of inter-ferometers due to bending of the scale itself
and errors when recording readings. However,
since the measurement reference consists of
a solid state scale, they are resistant to environment
influences and provide a superlative
stability appropriate to their resolution.
Therefore, although interferometers were used
previously, by the early 1990s, when primary
signal pitches in scales became finer than
the signal pitches in interferometers, scales
became the instrument of choice. Recently,
since mechanical hardnesses have increased
and error compensation has become easier,
currently almost all equipment is controlled
with these mechanical scales.
Figure 1 shows Dr. Norio Taniguchi’s predictions
for progress in mechanical accuracy
and the corresponding changes in scale accuracy.
Despite mechanical accuracy already
having reached the atomic level, there are
strong demands for increased accuracy from
semiconductor manufacturing equipment
development divisions, where line widths are
narrowing rapidly, magnetic disks, in which
the recording density increases steadily, and
optical disc write equipment, in which new
recording methods compete fiercely. To
respond to these demands, Sony has combined
their Laserscale technology with a new
interpolator that can interpolate to 1/8000 and
has achieved a resolution of about 17 pm.
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